Chengdu Zhongkopri Cleaning Equipment Co., Ltd.
Kuæa>Proizvodi>CZA series nitrogen removal argon purifier
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CZA series nitrogen removal argon purifier
CZA-4N/FX Series Inert Gas Purifier CZA-4N/FX Series Inert Gas Purifier's principle is to use alloy adsorbents in high temperature to react with impur
Detalji proizvoda

CZA-4N/FX series inert gas purifier

CZA-4N/FX series
Raan ye gas ye cɔl inert gas purifier ye, a ye cɔl alloy adsorbent ye cɔl inert gas ye cɔl argon, helium, radon, xenon ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye
Karakteristika Produk
n Degree of purity deep, not only removing O. N Degree of purity deep, not only removing O. N Degree of purity deep, not only removing O. N Degree of purity deep, not only removing O.2ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye2Kä kɔ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k
n Purifier kënë ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n
n A tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ
n series purifier configured with pre-purification tower, has removed more active impurities before the alloy adsorption tower, so greatly extended the service life of the alloy adsorption tower. n series purifier configured with pre-purification tower, has removed more active impurities before the alloy adsorption tower, so greatly extended the service life of the alloy adsorption tower.
Parameters teknis
Nyuɔ masin Model masin Kuen cida Kommentar
Gas inert purifier CZA-4N Semi-otomatik Ar
FX□-Z Semi-otomatik Ar, He, Xe, Ke wala Ne
Raw gas requirements
Ar、He
Purity ≥99.99% Argon cɔl, argon cɔl
Requirements of impurities (Wël ye kɔrɔ) O2≤200PPm, H2O≤1000PPm,N2≤100PPm
Gas puɔth Purity ≥99.9999%
Käke impurities O2≤0.5PPm; N2≤0.5PPm; H2O≤1PPm (cɔl tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈
CO+CO2≤0.1PPm; Yaa kä ye kek looi (≥0.3μm) 3-5 pcs/l
Pressure ye baara 0~1.0MPa
Gas hakkii 1~4Nm3/h
Kommentar Would be designed and manufactured according to user requirements. Would be designed and manufactured according to user requirements. Would be designed and manufactured according to user requirements.

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