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CZA series nitrogen removal argon purifier
CZA-4N/FX Series Inert Gas Purifier CZA-4N/FX Series Inert Gas Purifier's principle is to use alloy adsorbents in high temperature to react with impur
Detalji proizvoda
CZA-4N/FX series inert gas purifier
CZA-4N/FX seriesRaan ye gas ye cɔl inert gas purifier ye, a ye cɔl alloy adsorbent ye cɔl inert gas ye cɔl argon, helium, radon, xenon ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye cɔl inert gas ye
Karakteristika Produk
n Degree of purity deep, not only removing O. N Degree of purity deep, not only removing O. N Degree of purity deep, not only removing O. N Degree of purity deep, not only removing O.2ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye kɔrɔ ye2Kä kɔ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k peei ye kɛ̈k
n Purifier kënë ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n ye tɛ̈n
n A tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ
n series purifier configured with pre-purification tower, has removed more active impurities before the alloy adsorption tower, so greatly extended the service life of the alloy adsorption tower. n series purifier configured with pre-purification tower, has removed more active impurities before the alloy adsorption tower, so greatly extended the service life of the alloy adsorption tower.
Parameters teknis
Nyuɔ masin | Model masin | Kuen cida | Kommentar |
Gas inert purifier | CZA-4N | Semi-otomatik | Ar |
FX□-Z | Semi-otomatik | Ar, He, Xe, Ke wala Ne | |
Raw gas requirements Ar、He |
Purity | ≥99.99% Argon cɔl, argon cɔl | |
Requirements of impurities (Wël ye kɔrɔ) | O2≤200PPm, H2O≤1000PPm,N2≤100PPm | ||
Gas puɔth | Purity | ≥99.9999% | |
Käke impurities | O2≤0.5PPm; N2≤0.5PPm; H2O≤1PPm (cɔl tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈ CO+CO2≤0.1PPm; Yaa kä ye kek looi (≥0.3μm) 3-5 pcs/l |
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Pressure ye baara | 0~1.0MPa | ||
Gas hakkii | 1~4Nm3/h | ||
Kommentar | Would be designed and manufactured according to user requirements. Would be designed and manufactured according to user requirements. Would be designed and manufactured according to user requirements. |
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